This is the QA environment of the MD-SOAR platform. It is for TESTING PURPOSES ONLY. Navigate to https://mdsoar.org to access the latest open access research from MD-SOAR institutions.
QA Environment
 

Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂ Nanoscale Films

Simple item page
dc.contributor.authorKuis, Robinson
dc.contributor.authorGougousi, Theodosia
dc.contributor.authorBasaldua, Isaac
dc.contributor.authorBurkins, Paul
dc.contributor.authorKropp, Jaron A.
dc.contributor.authorJohnson, Anthony M.
dc.date.accessioned2020-11-23T17:36:03Z
dc.date.available2020-11-23T17:36:03Z
dc.date.issued2020-08
dc.description.abstractNonlinear refractive index, n₂, values as high as 1±.1x10⁻⁹ cm² /W were measured in atomic layer deposition (ALD) grown TiO₂ nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n₂ is believed due to the incorporation of nitrogen during growth.en_US
dc.description.urihttps://ieeexplore.ieee.org/abstract/document/9195674en_US
dc.format.extent2 pagesen_US
dc.genreconference papers and proceeedings postprintsen_US
dc.identifierdoi:10.13016/m2hqws-17ze
dc.identifier.citationR. Kuis, T. Gougousi, I. Basaldua, P. Burkins, J. A. Kropp and A. M. Johnson, "Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO2 Nanoscale Films," 2020 IEEE Research and Applications of Photonics in Defense Conference (RAPID), Miramar Beach, FL, USA, 2020, pp. 1-2, doi: 10.1109/RAPID49481.2020.9195674.en_US
dc.identifier.urihttps://doi.org/10.1109/RAPID49481.2020.9195674
dc.identifier.urihttp://hdl.handle.net/11603/20130
dc.language.isoen_USen_US
dc.publisherIEEEen_US
dc.relation.isAvailableAtThe University of Maryland, Baltimore County (UMBC)
dc.relation.ispartofUMBC Physics Department Collection
dc.relation.ispartofUMBC Faculty Collection
dc.relation.ispartofUMBC Student Collection
dc.relation.ispartofUMBC Computer Science and Electrical Engineering Department
dc.relation.ispartofUMBC Center for Advanced Studies in Photonics Research (CASPR)
dc.rightsThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.
dc.rights© 2020 IEEE.  Personal use of this material is permitted.  Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
dc.titleLarge Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO₂ Nanoscale Filmsen_US
dc.typeTexten_US

Files

Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
2020 IEEE RAPID Summary - AMJohnson (1).pdf
Size:
358.1 KB
Format:
Adobe Portable Document Format
Description:
Download
License bundle
Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
2.56 KB
Format:
Item-specific license agreed upon to submission
Description:
Download

Collections

UMBC Physics Department
UMBC Center for Advanced Studies in Photonics Research (CASPR)
UMBC Computer Science and Electrical Engineering Department
UMBC Faculty Collection
UMBC Student Collection