Kuis, RobinsonGougousi, TheodosiaBasaldua, IsaacBurkins, PaulKropp, Jaron A.Johnson, Anthony M.2020-11-232020-11-232020-08R. Kuis, T. Gougousi, I. Basaldua, P. Burkins, J. A. Kropp and A. M. Johnson, "Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO2 Nanoscale Films," 2020 IEEE Research and Applications of Photonics in Defense Conference (RAPID), Miramar Beach, FL, USA, 2020, pp. 1-2, doi: 10.1109/RAPID49481.2020.9195674.https://doi.org/10.1109/RAPID49481.2020.9195674http://hdl.handle.net/11603/20130Nonlinear refractive index, n₂, values as high as 1±.1x10⁻⁹ cm² /W were measured in atomic layer deposition (ALD) grown TiO₂ nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n₂ is believed due to the incorporation of nitrogen during growth.2 pagesen-USThis item is likely protected under Title 17 of the U.S. Copyright Law. Unless on a Creative Commons license, for uses protected by Copyright Law, contact the copyright holder or the author.© 2020 IEEE.  Personal use of this material is permitted.  Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.Text